Standard barrel type low temperature ashing devices suitable for a wide range of application such as ashing , etching and dry cleaning
Features
- Isotropy barrel type
- Compact, space saving design
- Capable of removing coated organic matter
- Adjustable RF suitable for various applications
- Outstanding operability and safety
- Can be set for a wide range of output conditions to handle a variety of testing samples
Applications
- Functionalization of the polymeric material surface improves adhesion
- Oxidation reaction generates functional groups -OH, >C=O, -COOH on the surface (very small amount of water and carbon dioxide will impact)
- In nitrogen plasma, a nitrogen atom is incorporated onto the surface, generates a functional group -NH₂ Resist peeling
- Surface modification of materials (metals, polymers, films, ceramics, etc.)
- Asbestos pre-processing (ashing of membrane filter)
- Low-temperature ashing (polymer material, coal, food, etc.) PDMS chips bonding to glass and PDMS substrate
- Production of semiconductors and analysis work
Models | PR200 | PR300-115V PR300-220V |
PR301-115V PR301-220V |
|
Plasma Mode | Direct plasma (DP) | Direct plasma (DP) | Direct plasma (DP) | |
High Frequency Output | Max. 200W | Max. 300W (100W x 3 chambers) | Max. 300W | |
Oscillation Frequency | 13.56MHz | |||
Tuning Method | Auto matching | Manual biaxial | Manual biaxial | |
Reaction Chamber (Pyrex Glass) | ø100×160mm x 1 chamber | ø64×160mm × 3 chambers | ø118×160mm x 1 chamber | |
Reaction Gas | 1 system (oxygen), flow meter control with dry air purge gas | |||
Control System | Manual leak valve | Auto pressure reduction, auto leak valve | ||
Piping Material | Stainless steel, Teflon | Stainless steel, Teflon, Copper and Brass | Stainless steel, Teflon | |
External Dimensions WxDxH | 350x400x500 mm | 438×520×556 mm | 438×520×660 mm | |
Weight | ~25kg | ~36kg | ~34kg | |
Power Source 50/60Hz | AC115V 13A | AC115V 6.1A AC220V 3.2A |
AC115V 6.1A AC220V 3.2A |